Effects of process parameters on synthesis of aluminium nitride thin film with cathode arc source assisted by electrons bath;
工艺参数对电子浴辅助阴极电弧源法合成AlN薄膜的影响
A new synthesizing aluminum nitride thin film method,which used activated reactive ion plating with cathode arc source assisted by electrons bath,was introduced.
研究了 N2 流量、阴极偏压、工作气压等工艺参数对电子浴辅助阴极电弧源法合成 Al N薄膜质量的影响规律及其原因。
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