Study of Low Temperature Plasma Enhanced Chemical Vapor Deposition and the Preparation of Si_3N_4 Thin Film;
低温等离子体增强CVD技术及制备氮化硅薄膜的研究
plasma-enhanced CVD
等离子体增强CVD
The Research of Synthesis Technology and Mechanism on Diamond Films at Low Temperature in MWPCVD;
微波等离子体低温CVD金刚石膜工艺和机理研究
The Research about Mechanism of Plasma arc Polishing CVD Diamond Films
CVD金刚石膜等离子体弧抛光的机理研究
Ultra-thin C-N-Si Protective Films Prepared by Plasma Enhanced Deposition;
等离子体增强沉积C-N-Si超薄保护膜
Deposition of orthorhombic boron nitride films by plasma-enhanced pulsed laser deposition
等离子体增强脉冲激光沉积o-BN薄膜
Microstructure and Properties of a-Si_(1-x)C_x:H Thin Films Prepared by PECVDs;
等离子体CVD法制备a-Si_(1-x)C_x:H薄膜及其微结构和性能研究
The Synthesized Processing Study of Diamond Films Deposition on the WC-Co Tools Substrate by DC Arc Discharge Plasma CVD;
直流弧光放电等离子体CVD金刚石薄膜硬质合金刀具制备工艺研究
APPLICATION OF MAGNETIC MIRROR IN DIRECT COUPLER MPCVD DIAMOND FILMS DEVICE
磁镜场在直接耦合式微波等离子体CVD金刚石膜装置中的应用
Prepared TiN Thin Films by LTP Enhanced Electronic Beam Evaporation;
低温等离子体增强电子束蒸发沉积TiN的研究
Photoluminescence Enhancement of Silicon-based Semiconductor Materials by Coupling with Metal Surface Plasmon
金属表面等离子体增强硅基半导体材料发光
high ionized laser plasma
强电离激光等离子体
A Study on Numerical Simulation of Ignition and Combustion Enhancement with Plasma in Bore of ETC Guns
膛内等离子体点火及燃烧增强过程数值模拟
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究
Numerical Simulation of Interior Ballistic Process Augmentation by Plasma;
等离子体增强作用的内弹道过程数值模拟
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
Study of Enhancement Effect of Laser-Induced Crater on Plasma Radiation
激光诱导熔穴对等离子体辐射增强效应的研究
本网站所收集内容来自网友分享仅供参考,实际请以各学校实际公布信息为主!内容侵权及错误投诉:1553292129@qq.com
CopyRight © 2020-2024 优校网[www.youxiaow.com]版权所有 All Rights Reserved. ICP备案号:浙ICP备2024058711号