The emergence of aluminium implant technology (“i2”) at Dynex Semiconductor for the manufacture of power bipolar semiconductor devices has been well documented.
Dynex半导体公司用于功率双极半导体器件制造的铝注入技术(“i2”)的问世得到文献的肯定。
This paper presents the overview of the most common fault injection techniques and summarizes the most relevant work in this area.
故障注入技术越来越广泛地运用于嵌入式系统容错能力的确认和验证中。
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